Captures high-resolution images under a range of process conditions
The ParticleView V19 continuously captures high-resolution images under a range of process conditions
Mettler Toledo's new particle vision and measurement (PVM) tool, ParticleView V19, continuously captures high-resolution images under a range of process conditions. It then automatically prepares a report pairing the most relevant images to data tracking particle size and concentration changes.
The company says this ability to pair relevant images with trend data means a reduction in the time and effort required to investigate significant process events or upsets. Because scientists are able easily to determine the influence of process conditions on particle size and shape, processes can then be designed so that particles behave more predictably. Scientists can also eliminate the need for cumbersome and sometimes inaccurate offline sampling.
Continuous monitoring with ParticleView V19 offers researchers knowledge on complex particle systems that might otherwise be too time-consuming or expensive to obtain – such as polymorphic transformations, phase separation events and the formation of delicate structures such as flocs, dendrites and droplets.
Common applications for the V19 with PVM technology include understanding crystallisation; identifying growth, agglomeration, breakage and shape changes; controlling particle size and shape; monitoring polymorphic transitions; identifying the source of batch-to-batch inconsistencies; optimising oil/water separations; and viewing particle and droplet systems in locations where offline sampling is not feasible (such as high-pressure lines).