Corning unveils advanced photo reactor for continuous flow photochemistry

Published: 30-Oct-2014

The company's Advanced-Flow reactor range is readily scalable from lab to production scale

Corning's success with its Advanced-Flow reactor technology has led it to launch in 2014 the Advanced-Flow G1 photo reactor which offers tunable ultraviolet light to enable photoreactions on a kilo lab and pilot scale.

The consistent distribution of UV light to chemicals ensures better performance for photochemical reactions, leading to higher yields.

The G1 photo reactor is intended for customers looking to carry out photochemistry with the benefit of the heat-and mass-transfer capabilities of an Advanced-Flow reactor.

Designed as a process development and/or pilot scale tool, it offers a flow range of 10-150 ml/min and a pressure range of up to 18 bar. It has a tunable UV LED irradiation source available in multiple wavelength arrays. Both sides of the glass fluidic modules can be illuminated with variable light intensity.

Corning's innovative Advanced-Flow reactor products are developed in response to market needs and offer users the economic benefits of handling large volumes (some up to 300kg per hour) with a small footprint and can be used either in the lab or for production at scales of up to 300 kg/hour. The reactors are also designed to enable easy, seamless scale-up to quickly reach the industrial size.

The company already has some industrial size G4 ceramic reactors in use in industry. The reactors are TUV certified in Europe and SELO-certified in Asia.


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